Tonk Orthopedic Implants
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Three targets RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
The device is equipped with three 300W RF power supply. The RF power supply can be used for the preparation of non-metal. The three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized from 300W to 1000W.
This device is ideal for preparing single-layer or multi-layer films, including:
| Sample Stage | Size: φ185mm | Accuracy: ±1ºC |
| Heating: Max 500ºC | Rotation: 1-20rpm adjustable | |
| Sputtering Head | Quantity: 2"×3 (1", 2" optional) | Water Chiller: 10L/min flow rate |
| Cooling: Water cooling | - | |
| Vacuum Chamber | Size: φ300mm×300mm | Window: φ100mm |
| Material: Stainless steel | Opening: Top cover open | |
| Vacuum System | Ultimate vacuum: 1.0E-5Pa; Molecular pump: 600L/S; Pumping to 1.0E-3Pa in 20 mins | |
| Power & Size | Total Power: 2.5KW | Size: 600mm×650mm×1280mm |
