Tonk Orthopedic Implants
1 / 5
| Model NO. | CY-ALD | Type | Coating Production Line |
| Coating | Vacuum Coating | Certification | CE |
| Condition | New | Wafer Dimension | 8 Inch and Below |
| Wafer Temperature | Rt-400c, Controlling Precision +-0.1c | Number of Precursor | Three Precursor Lines (Optional More) |
| Background Vacuum | <5*10-3torr | Gas Carrier System | N2 or Ar |
| HS Code | 8412800090 | Production Capacity | 200 Sets Per Month |
Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments of industrialization. The electric of the system completely accords with the CE criterion. It is widely used in the fields of micro-electronic, nano material, optical film, solar battery, etc.
Key Benefits:
Supported ALD Films:
Elementary & Nitrides:
Co, Cu, Ta, Ti, W, Ge, Pt, Ru, Ni, Fe / TiN, SiN, AlN, TaN, ZrN, HfN, WN
Oxides & Others:
TiO2, HfO2, SiO2, ZnO, ZrO2, Al2O3, SnO2 / GaAs, AlP, InP, SrTiO3
| Wafer Temperature | RT-400ºC, Controlling precision ±0.1ºC |
| Temperature of Source Bottles | RT-200ºC, Controlling precision ±0.1ºC |
| ALD Valve | Swagelok ALD swift valve |
| Growing Mode | Consecutive or interval deposition mode |
| Controlling System | PLC plus touch screen or display |
| Deposition Heterogeneity | <±1% |
| Dimensions | 600mm x 600mm x 1100mm |
| Weight / Package Size | 280kg / 1200cm x 800cm x 1100cm |
